Title:
プラズマ源
Document Type and Number:
Japanese Patent JP6680271
Kind Code:
B2
Abstract:
A plasma source is provided. The plasma source includes a chamber body, a supply passage, a vacuum connector, an antenna, a first insulator, a second insulator, and a conductor. The chamber body has an opening for emitting ions or electrons. The supply passage penetrates through a first peripheral wall of the chamber body. The vacuum connector is provided in a second peripheral wall of the chamber body at a position opposed to the opening. The antenna has a base end connected to the vacuum connector, and extends inside the chamber body toward the opening. The first insulator covers a first region of the antenna at a distal end of the antenna inside the chamber body. The second insulator covers a second region of the antenna at the base end of the antenna inside the chamber body. The conductor covers the second insulator.
Inventors:
Hideki Fujita
Itoi Hayao
Itoi Hayao
Application Number:
JP2017123084A
Publication Date:
April 15, 2020
Filing Date:
June 23, 2017
Export Citation:
Assignee:
Nissin Ion Equipment Co., Ltd.
International Classes:
H05H1/46; H01J27/16
Domestic Patent References:
| JP10229000A | ||||
| JP2005293955A | ||||
| JP2004172622A |
Foreign References:
| WO2015114992A1 | ||||
| US20110018443 |
Attorney, Agent or Firm:
Kimura Mitsuru
Shiro Ryutake
Shiro Ryutake