Title:
PLASMA TREATING DEVICE
Document Type and Number:
Japanese Patent JPH11149998
Kind Code:
A
Abstract:
To uniformly conduct plasma treatment.
An exhaust path 28 opening an exhaust opening 16 toward a plasma treating space 13 is formed in a flat plate 11 on one side or a second mechanism 21 on a plasma generating space 22 side. The exhaust openings 16 are dispersed. Difference in distance moving for exhausting treatment-finished gas between the central part and the peripheral part of the plasma treating space is decreased, and as a result, uniformity exceeding uniformity obtained by the uniform supply of plasma or treating gas can be obtained.
Inventors:
OKUMURA YUTAKA
NOZAWA TOSHIHISA
ISHIBASHI KIYOTAKA
NOZAWA TOSHIHISA
ISHIBASHI KIYOTAKA
Application Number:
JP33095397A
Publication Date:
June 02, 1999
Filing Date:
November 14, 1997
Export Citation:
Assignee:
FOI KK
KOBE STEEL LTD
KOBE STEEL LTD
International Classes:
H05H1/46; C23C16/50; C23F4/00; H01L21/205; H01L21/302; H01L21/3065; H01L21/31; (IPC1-7): H05H1/46; C23C16/50; C23F4/00; H01L21/205; H01L21/3065
Attorney, Agent or Firm:
Satou Kaori