PLASMA TREATMENT APPARATUS AND METHOD FOR DRIVING THE SAME

Japanese Patent JP3609448

B2

PURPOSE: To simultaneously execute plasma processing of many workpieces in parallel and to rapidly execute the plasma processing at a low cost by piling the many plasma chambers of a vacuum plasma treatment apparatus for the workpieces to a stack form.
CONSTITUTION: The many plasma chambers 1 are piled to the stack form 20 and operation apertures 17 are respectively piled in the respective chambers 1 and are communicated with the common vacuum chamber 23. A transfer device 25 for the workpieces 31 is disposed in the transfer space 23r of the vacuum chamber 23. This transfer device 25 horizontally has many forked supporting bodies 27 and move these supporting bodies in a horizontal direction H in synchronization to insert the workpieces 31 of the flat shape into the plasma chambers 1. After the workpieces are set in the treatment apparatus in the chambers 1 by descending of a lifting device 9, reaction gases are supplied and the surfaces of the workpieces 31 are subjected to a vacuum plasma treatment with an electric discharge by electrodes. The many workpieces 31 are simultaneously and efficiently subjected to the vacuum plasma treatment in parallel with the min. operation cycles.

Emmanuel Tourlot
Thierry Emeraud
Jack schmidt

JP9447094A

January 12, 2005

May 06, 1994

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Unaxis Balzers Akchen Gesell Shaft

C23C16/44; C23C16/50; C23C16/503; C23C16/509; C23C16/54; C23F4/00; H01J37/32; H01L21/00; H01L21/302; H01L21/3065; H01L21/677; (IPC1-7): C23C16/44; C23C16/503; C23F4/00; H01L21/3065

JP5144735A
JP4240721A
JP5152215A
JP3274746A

Takashi Ishida
Toshio Toda
Masaya Nishiyama

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