PLASMA TREATMENT DEVICE AND PLASMA LIGHTING METHOD

Title:

PLASMA TREATMENT DEVICE AND PLASMA LIGHTING METHOD

Document Type and Number:

Japanese Patent JP2002008894

Kind Code:

A

Abstract:

To provide an inexpensive plasma treatment device capable of turning on the plasma certainly and making the starting operation in good performance.

The plasma treatment device according to the present invention is structured so that under a pressure in the vicinity of the atmospheric pressure, a high-frequency discharge plasma is generated in a reaction vessel 2 whose one side is left open as a blowout hole 1, and the generated plasma is allowed to blow in jet form out of the blowout hole 1 in the reaction vessel 2, and is equipped with an igniting means 5 to turn on the plasma, whereby the plasma can be turned on in such a way that no high voltage is impressed to an impedance matching circuit.

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Inventors:

TAGUCHI NORIYUKI
SAWADA KOJI
YAMAZAKI KEIICHI
NAKAZONO YOSHIYUKI
INOOKA YUKIKO

Application Number:

JP2000193415A

Publication Date:

January 11, 2002

Filing Date:

June 27, 2000

Export Citation:

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Assignee:

MATSUSHITA ELECTRIC WORKS LTD

International Classes:

H05H1/24; C23C16/513; H01L21/302; H01L21/3065; H05H1/34; (IPC1-7): H05H1/24; C23C16/513; H01L21/3065; H05H1/34

Attorney, Agent or Firm:

Keisei Nishikawa (1 person outside)

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