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Title:
PLASMA TREATMENT DEVICE AND PLASMA TREATMENT METHOD
Document Type and Number:
Japanese Patent JP2001006897
Kind Code:
A
Abstract:

To provide a plasma treatment device capable of extending the service life of an electrode, not causing the contamination of a treated object even when it is used over a long time, and capable of reducing a radiation high-frequency noise.

This plasma treatment device is composed by providing a cylindrical reaction tube 2 having one side opened as a jetting hole 1, and a pair of electrodes 3, 4. A plasma producing gas is introduced into the reaction tube 2. By applying an A.C. electric field between the pair of electrodes 3, 4, glow- like discharge is generated in the reaction tube 2 under the atmospheric pressure. The plasma treatment device carries out plasma treatment to a treated object 6 by the use of spouted plasma 5 by jetting the jet-like plasma 5 from the jetting hole 1 of the reaction tube 2. The pair of electrodes 3, 4 are formed outside the reaction tube 2 by facing them to each other. Both the electrodes 3, 4 are prevented from being directly exposed to the plasma 5.


Inventors:
YAMAZAKI KEIICHI
SAWADA KOJI
TAGUCHI NORIYUKI
NAKAZONO YOSHIYUKI
INOOKA YUKIKO
YASUDA MASAHARU
KITAYAMA KAZUYA
NAKAMURA KOSUKE
SEI MIKIO
KITAMURA KEIMEI
Application Number:
JP30311699A
Publication Date:
January 12, 2001
Filing Date:
October 25, 1999
Export Citation:
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Assignee:
MATSUSHITA ELECTRIC WORKS LTD
International Classes:
B23K10/00; H01L21/302; H01L21/3065; H05H1/30; (IPC1-7): H05H1/30; B23K10/00; H01L21/3065
Attorney, Agent or Firm:
Keisei Nishikawa (1 person outside)