To disclose a plate, a substrate temperature control apparatus having the plate, and a substrate processing apparatus having the substrate temperature control apparatus.

In a plate for controlling a temperature of a substrate, the substrate can be supported by a body. A first channel and a second channel can be disposed in the body. The first channel has a first inlet port and a first outlet port and allows a first fluid for controlling the temperature of the substrate to pass through. The second channel has a second inlet port located adjacent to the first outlet port and a second outlet port located adjacent to the first inlet port and allows a second fluid for controlling the temperature of the substrate to pass through. Further, the first channel and the second channel are arranged parallel to each other. Thus, the temperature of the substrate can be uniformly controlled.