Title:
研摩材料を保持するためのプラテン
Document Type and Number:
Japanese Patent JP2004534660
Kind Code:
A
Abstract:
Generally, a method and apparatus for retaining polishing material is provided. In one embodiment, the apparatus includes a platen having a top surface, a plurality of channels and one or more vacuum ports. The top surface is adapted to support the polishing material. The plurality of channels are formed in a polishing area of the top surface. The vacuum ports are disposed in the platen and at least one port is in communication with at least one of the channels. Upon application of a vacuum to the ports, the channels remove fluids under the polishing material while securing the polishing material to the top surface.
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Inventors:
Lee, Syrian
Billung, Manuture
Emami, Ramin
Andrew, Nagengast
Brown, Dourass Okat
One, Seapin
Skars, martin
White, john
Billung, Manuture
Emami, Ramin
Andrew, Nagengast
Brown, Dourass Okat
One, Seapin
Skars, martin
White, john
Application Number:
JP2002541711A
Publication Date:
November 18, 2004
Filing Date:
November 06, 2001
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
B24B21/04; B24B37/16; B24D9/08; B25B11/00; H01L21/304; H01L21/306; (IPC1-7): B24B37/04; H01L21/304
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yuichi Yamada
Yasuhito Suzuki
Yuichi Yamada
Yasuhito Suzuki