Title:
偏光ビームスプリッタ、露光装置、デバイス製造システム及びデバイス製造方法
Document Type and Number:
Japanese Patent JP6512253
Kind Code:
B2
Abstract:
The present invention is provided with: a mask holding drum (21) that holds a reflective mask (M); a beam splitter (PBS), which reflects an inputted lighting luminous flux (EL1) toward the mask (M), and which passes through a projection luminous flux (EL2) obtained by having the lighting luminous flux (EL1) reflected by means of the mask (M); a lighting optical module (ILM) that inputs the lighting luminous flux (EL1) to the beam splitter (PBS); and a projection optical module (PLM) that performs projection exposure with respect to a substrate (P) using the projection luminous flux (EL2) that has passed through the beam splitter (PBS). The lighting optical module (ILM) and the beam splitter (PBS) are provided between the mask (M) and the projection optical module (PLM). Furthermore, the beam splitter (PBS) is provided with a first prism, a second prism, and a polarization film, and the polarization film (93) has a silicon dioxide first film body, and a hafnium oxide second film body laminated therein in the film thickness direction.
Inventors:
Masaki Kato
Tetsuo Suzuki
Kamada Gotada
Masanori Arai
North Hironori
Tetsuo Suzuki
Kamada Gotada
Masanori Arai
North Hironori
Application Number:
JP2017178349A
Publication Date:
May 15, 2019
Filing Date:
September 15, 2017
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; G02B5/04; G02B5/30; G02B17/08; G02B19/00
Domestic Patent References:
| JP11264904A | ||||
| JP2006047903A | ||||
| JP2003114326A | ||||
| JP2001297980A | ||||
| JP2006220879A | ||||
| JP2008304614A | ||||
| JP1241502A | ||||
| JP2007163804A |
Attorney, Agent or Firm:
Sakai International Patent Office