POLISHING CLOTH AND SURFACE POLISHING WORK METHOD

Japanese Patent JP3697963

B2

PROBLEM TO BE SOLVED: To provide a polishing cloth and a surface polishing work method so improved that a characteristic thereof can be effectively displayed by attaining improvement of polishing work performance and polishing accuracy relating to a workpiece particularly by using through combination with a colloid- state polishing fluid.
SOLUTION: This polishing cloth is applied for a surface polishing device or the like by coating an inner surface of a pair of upper/lower rotary level blocks 1, 2 with a polishing cloth 5 to interpose a workpiece 4 from upward/ downward and supplying a polishing fluid 6 dropped between the workpiece and the polishing cloth to perform polishing work of the workpiece. In the polishing cloth, consisting of a sheet-state surface layer 5b made by a base layer 5a and a soft plastic foam layered on the base layer, the surface layer 5a is formed by a closed cell foam coating its surface with a skin layer of non-foaming and wrapping a cell (bubble) in the layer without opening to the surface, and surface polishing work of the workpiece is performed by combination with a colloid-state polishing fluid with colloidal serving as an abrasive grain as the polishing fluid.

Mitsuyoshi Ichino
Koji Nakamura
Yoshiaki Ishizawa
Taiji Ito
Takahiro Shimobayashi
Gosuke Ikemori
Yuichiro Fujisawa

JP24362099A

September 21, 2005

August 30, 1999

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Fuji Electric Device Technology Co., Ltd.

B24B29/00; B24B37/20; B24B37/22; B24B37/24; B24D13/14; G11B5/84; (IPC1-7): B24B37/00; B24B29/00; G11B5/84

JP11151651A
JP6023664A
JP9234670A
JP61079575A
JP61014854A

US4966609

Masaharu Shinobe

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