Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
POLISHING DEVICE AND POLISHING METHOD
Document Type and Number:
Japanese Patent JP2004154874
Kind Code:
A
Abstract:

To provide a polishing device which automates adjusting work of a lowered location of a member forming a top ring, and shortens the time required for the adjusting work, and to provide a polishing method.

The polishing device is formed of a stopper 32, a bracket 28, a sensor 36, and an elevating unit 34. The bracket 28 ascends/descends together with the top ring 20 and is engageable with the stopper 32. The sensor 36 detects a distance between the stopper 32 and the bracket 28. The elevating unit 34 adjusts the location of the stopper 32 when a retainer ring 44 is brought into contact with a polishing pad 10 while a lower surface of a housing 40 of the top ring 20 is located at a predetermined height from the polishing pad 10, such that the distance between the stopper 32 and the bracket 28 becomes equal to a difference between the height of the lower surface of the housing 40 at the time of polishing, and the predetermined height.


Inventors:
HAYAMA TAKUJI
INOUE MASABUMI
SAKURAI KUNIHIKO
Application Number:
JP2002320725A
Publication Date:
June 03, 2004
Filing Date:
November 05, 2002
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
EBARA CORP
International Classes:
B24B47/26; B24B37/07; B24B47/22; B24B49/00; B24B49/16; H01L21/304; H01L21/306; (IPC1-7): B24B37/04; B24B47/26; B24B49/00; H01L21/304
Attorney, Agent or Firm:
Isamu Watanabe
Shintaro Hotta
Ryoji Kosugi
Tomohiro Mori