研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法

Title:

研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法

Document Type and Number:

Japanese Patent JP7201639

Kind Code:

B2

Abstract:

Letting a particle diameter be Dx (μm) when a cumulative particle volume cumulated from the small particle diameter side reaches x (%) of the total particle volume in a particle size distribution obtained regarding cerium oxide included in a polishing liquid using a laser diffraction/scattering method, D5 is 1 μm or less, D100 is 3 μm or more, D50 is 0.8 to 2.4 μm, and Dpeak−D5 is less than D95−Dpeak.

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Inventors:

Toshio Takizawa

Application Number:

JP2020071965A

Publication Date:

January 10, 2023

Filing Date:

April 13, 2020

Export Citation:

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Assignee:

HOYA CORPORATION

International Classes:

C09K3/14; B24B1/00; B24B29/00; B24B37/00; C01F17/235; C09G1/02; G11B5/84

Domestic Patent References:

JP2014197449A
JP201220377A
JP2002371267A
JP2008284679A
JP2002301655A
JP2002180034A
JP2018506618A

Foreign References:

WO2013069720A1
WO2016002825A1

Attorney, Agent or Firm:

Global IP Tokyo Patent Business Corporation

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