Title:
大型単結晶ダイヤモンドの研磨方法
Document Type and Number:
Japanese Patent JP7341532
Kind Code:
B2
Abstract:
Forming an amorphous carbon layer due to lattice distortion of carbon atoms on a surface layer of a single-crystal diamond under a mechanical shear function of a hard abrasive, and generating a chemical reaction between the amorphous carbon layer on the surface layer and the reactive abrasive to achieve quickly removing carbon atoms on the surface layer of the single-crystal diamond due to a local high temperature between abrasive grains and the single-crystal diamond caused by friction at a high speed.
Inventors:
Rikusei
Xu Xi Peng
Wang Luo
Luo Qin
Xiaoping
Xu Xi Peng
Wang Luo
Luo Qin
Xiaoping
Application Number:
JP2021541738A
Publication Date:
September 11, 2023
Filing Date:
October 23, 2020
Export Citation:
Assignee:
Huayuan University
International Classes:
B24B1/00; B24B37/00; B24D3/00; B24D3/02; B24D3/28; B24D11/00; C30B29/04; C30B33/00; H01L21/304
Foreign References:
| CN110026831A |
Other References:
Yingchao Lin,Surface damage of single-crystal diamond(100) processed based on a sol-gel polishing tool,Diamond & Related Materials,2018年03月,83号,P46-53
Attorney, Agent or Firm:
▲吉▼川 俊雄
Hiroshi Ichikawa
Hiroshi Ichikawa