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Patent Searching and Data


Title:
POLISHING METHOD AND POLISHING TANK THEREOF
Document Type and Number:
Japanese Patent JPH04101762
Kind Code:
A
Abstract:

PURPOSE: To eliminate a scratch and to finish polishing with an extremely high accuracy in a short time, by composing a polishing tank used for the work machine device of a barrel polishing machine, etc., so that the length becomes more than 1.3 times as long as the diameter.

CONSTITUTION: Rotation is given with the body 2 to be worked and a polishing member 3 being input into a polishing tank 1 whose length L is made more than 1.3 times as long as its diameter . A precise polishing finish is thus completed in a short time without any gouge nor generation of scratch, because of the rubbing, superposing, colliding, etc., of the body 2 to be worked each other having gone.


Inventors:
ONO IETATSU
Application Number:
JP21263690A
Publication Date:
April 03, 1992
Filing Date:
August 11, 1990
Export Citation:
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Assignee:
ONO IETATSU
International Classes:
B24B31/06; (IPC1-7): B24B31/06