Title:
POLISHING PAD
Document Type and Number:
Japanese Patent JP2021053765
Kind Code:
A
Abstract:
To prevent a window for endpoint detection from falling off from a polishing layer when polishing an object to be polished.SOLUTION: A polishing pad 3 includes a polishing layer 3C whose top face is a polishing surface 3A, and a transparent window 3B for endpoint detection is positioned at a prescribed position in the polishing layer 3C. The window 3B for endpoint detection transmits inspection light L1, and further transmits reflectance from an object 2 to be polished. During polishing, an endpoint of polishing can be detected on the basis of changes in intensity of the reflectance from the object to be polished. On an outer peripheral part of the window 3B for endpoint detection, a plurality of bulged parts 3Ba are formed, whereas on an inner peripheral surface of an open hole 3Ca of the polishing layer 3C, recesses 3Cb engaging with the bulged parts 3Ba are formed. Since the plurality of bulged parts 3Ba are engaged with the recesses 3Cb, the window 3B for endpoint detection is prevented from falling off from the open hole 3Ca of the polishing layer 3C during polishing of the object 2 to be polished.SELECTED DRAWING: Figure 3
Inventors:
MATSUOKA RYUMA
KURIHARA HIROSHI
NARUSHIMA SATSUKI
TAKAMIZAWA YAMATO
KURIHARA HIROSHI
NARUSHIMA SATSUKI
TAKAMIZAWA YAMATO
Application Number:
JP2019180493A
Publication Date:
April 08, 2021
Filing Date:
September 30, 2019
Export Citation:
Assignee:
FUJIBO HOLDINGS INC
International Classes:
B24B37/24; B24B37/26; C08G18/10; C08J5/14; H01L21/304
Attorney, Agent or Firm:
Makoto Kanzaki
Shinichiro Kanzaki
Shinichiro Kanzaki