Title:
Poly urea resin, a manufacturing method for the same, a capacitor element, and a manufacturing method for the same
Document Type and Number:
Japanese Patent JP5944304
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide polyurea having both excellent heat resistance and flexibility, and capable of efficiently enhancing self recoverability of a film capacitor element.SOLUTION: Polyurea is constituted by a molecular structure with a network structure manufacture by conducting a vapor deposition polymerization method by using 2 or more kinds of raw monomers consisting of aliphatic monomers containing at least one kind of a raw monomer having 3 or more functional groups capable of reacting with functional groups which the other raw monomers have.
Inventors:
Takaaki Tanaka
Application Number:
JP2012271870A
Publication Date:
July 05, 2016
Filing Date:
December 13, 2012
Export Citation:
Assignee:
Kojima Industries Corporation
International Classes:
H01G4/18; C08G18/32; H01G4/015; H01G4/30
Domestic Patent References:
| JP59059221A | ||||
| JP5335632A | ||||
| JP2011063865A | ||||
| JP2011084773A | ||||
| JP2008056790A | ||||
| JP2006220475A | ||||
| JP2002019011A | ||||
| JP2002284874A | ||||
| JP4100523A | ||||
| JP6254365A | ||||
| JP2007009101A | ||||
| JP2000106324A | ||||
| JP2011061191A |
Foreign References:
| WO2007111076A1 |
Attorney, Agent or Firm:
Michio Nakajima
Masahiro Nakashima
Masahiro Nakashima
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