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Title:
POLYAMIC ACID AND PRODUCTION OF POLYMER FROM POLYAMIC ACID THROUGH RING CLOSURE BY DEHYDRATION
Document Type and Number:
Japanese Patent JP3143891
Kind Code:
B2
Abstract:

PURPOSE: To obtain a high-mol. polyamic acid which gives a coating film reduced in cracking by reacting a tetracarboxylic dianhydride with a diamine in the presence of a compound containing one carboxyl group per molecule.
CONSTITUTION: A tetracarboxylic dianhydride (A) is reacted with a diamine (B) (e.g. p-phenylenediamine) in the presence of a compound (C) containing one carboxyl group per molecule to produce a polyamic acid. This acid is caused to undergo ring closure by dehydration to produce a polymer. Preferred examples of the ingredient (A) include butanetetracarboxylic dianhydride and 1,2,3,4-cyclobutanetetracarboxylic dianhydride. Examples of the ingredient (C) include acetic acid and benzoic acid. The obtained polyamic acid and its polymer are useful as a liquid-crystal alignment film, an insulating film for a semiconductor circuit element, a covering material for an enameled wire, an adhesive, a coating compound, etc.


Inventors:
General Nishikawa
Go Miyamoto
Shigeo Kawamura
Tadahiko Udagawa
Yasuo Matsuki
Application Number:
JP25396394A
Publication Date:
March 07, 2001
Filing Date:
October 19, 1994
Export Citation:
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Assignee:
JSR Corporation
International Classes:
C08G73/10; (IPC1-7): C08G73/10
Domestic Patent References:
JP6176525A
JP5181899A
JP6192420A
JP7157560A
Attorney, Agent or Firm:
Masataka Oshima