Title:
POLYMER AND ANTIREFLECTION FILM FORMING COMPOSITION
Document Type and Number:
Japanese Patent JP2005015532
Kind Code:
A
Abstract:
To provide an antireflection film forming composition which has a high antireflection effect, does not cause intermixing, and can form a resist pattern excellent in resolution, pattern shape, etc.; and a polymer useful as a constituting component for the composition.
The polymer comprises first structural units represented by formula (1) and second structural units having cross-linking properties. In formula (1), R1 and R2 are each a monovalent atom or a monovalent organic group; R3 and R4 are each a hydrogen atom or a monovalent organic group; and m and n are each an integer of 0 or 1-3.
Inventors:
TANAKA MASATO
SUGITA HIKARI
KONNO KEIJI
NISHIMURA ISAO
NOMURA NAKAATSU
SHIMOKAWA TSUTOMU
SUGITA HIKARI
KONNO KEIJI
NISHIMURA ISAO
NOMURA NAKAATSU
SHIMOKAWA TSUTOMU
Application Number:
JP2003178719A
Publication Date:
January 20, 2005
Filing Date:
June 23, 2003
Export Citation:
Assignee:
JSR CORP
International Classes:
G03F7/11; C08F220/28; C08F220/58; C08F232/08; C08K5/00; C08L33/14; C08L33/24; C08L45/00; G02B1/11; H01L21/027; (IPC1-7): C08F232/08; C08F220/28; C08F220/58; C08K5/00; C08L33/14; C08L33/24; C08L45/00; G02B1/11; G03F7/11; H01L21/027
Attorney, Agent or Firm:
Ippei Watanabe
Koji Kikawa
Takeshi Higuchi
Koji Kikawa
Takeshi Higuchi