Title:
高分子組成物
Document Type and Number:
Japanese Patent JP4572445
Kind Code:
B2
Abstract:
A polymer composition having satisfactory processing stability is provided which comprisesa polymer;a bisphenol monoester represented by the Formula (1):wherein R1 represents hydrogen, alkyl or phenyl group; R2 and R3 each independently represents alkyl group; and R4 and R5 each independently represents hydrogen or methyl group; and a bisphenol diester represented by Formula (2)wherein R6 represents hydrogen, alkyl or phenyl group; R7 and R8each independently represents alkyl group; and R9 and R10 each independently represents hydrogen or methyl group in which amount of the compound of formula (2) is 0.001 to 5 parts by weight based on 100 parts by weight of the total amount of the compounds of formulae (1) and (2).
Inventors:
Kanako Fukuda
Application Number:
JP2000157814A
Publication Date:
November 04, 2010
Filing Date:
May 29, 2000
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C08L57/00; C08L101/00; C08F291/00; C08K5/107; C08K5/134; C08L21/00; C08L53/00
Domestic Patent References:
| JP4327558A | ||||
| JP63179953A | ||||
| JP2000143873A | ||||
| JP6092901A | ||||
| JP11193381A | ||||
| JP61027943A |
Attorney, Agent or Firm:
Toru Nakayama