POLYMER COMPOUND, RESIST MATERIAL AND PATTERN FORMING METHOD

Japanese Patent JP3912484

B2

PROBLEM TO BE SOLVED: To provide a resist material which is sensitive to a high-energy ray being excellent in sensitivity for the wavelength of 200 nm or below, particularly 170 nm or below, besides in which plasma-etching resistance is improved by introduction of a cyclic alkyl group to a principal chain as well as an excellent resolving property is proved.
SOLUTION: A polymer compound comprises a repeating unit represented by general formula (1) and a repeating unit which has an acid-unstable group, (R1 and R2 are each a hydrogen atom, or a 1-20C straight-, branched-chain or a cyclic alkyl group; R1 and R2 may bond to each other to form a ring, in that case, they are each a 1-20C straight-, branched-chain or a cyclic alkylene group or they form a bond represented by -O-, -S-, or -NH-; j is an integer of 2-4; and k is 0 or 1).

JP2781252	PROBLEM TO BE SOLVED: To produce a cyclic olefin-based random copolymer
JP3361809	INDUSTRIAL APPLICABILITY: Cycloolefin copolymer having high tear strength and low optical attenuation
JP2001506293	[Title of Invention] Method for Producing Cycloolefin Copolymer

Yuji Harada
Jun Hatakeyama
Jun Watanabe
Yoshio Kawai
Masako Sasako
Masataka Endo
Kishimura Shinji
Mitsutaka Otani
Satoru Miyazawa
Kentaro Tsutsumi
Kazuhiko Maeda

JP2001266788A

May 09, 2007

September 04, 2001

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Shin-Etsu Chemical Co., Ltd.
Matsushita Electric Industrial Co., Ltd
Central Glass Co., Ltd.

C08F232/00; G03F7/039; C08F220/10; C08F222/40; G03F7/004; H01L21/027; (IPC1-7): C08F232/00; C08F220/10; C08F222/40; G03F7/039; H01L21/027

JP11160877A

Takashi Kojima
Yuko Nishikawa

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