Title:
高分子化合物、化学増幅レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4780262
Kind Code:
B2
Inventors:
Jun Hatakeyama
Jun Watanabe
Yuji Harada
Jun Watanabe
Yuji Harada
Application Number:
JP2001124021A
Publication Date:
September 28, 2011
Filing Date:
April 23, 2001
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08F32/00; G03F7/004; C08G61/00; C08L45/00; C08L65/00; G03F7/039; H01L21/027
Domestic Patent References:
| JP11202491A | ||||
| JP10111569A | ||||
| JP63210114A | ||||
| JP2001296662A |
Foreign References:
| WO2001074916A1 |
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yuko Nishikawa