Title:
フォトレジスト用高分子化合物、単量体化合物、感光性樹脂組成物、これを用いたパターン形成方法、および電子部品の製造方法
Document Type and Number:
Japanese Patent JP4034538
Kind Code:
B2
Abstract:
Disclosed is a polymer compound for photoresist characterized in that the polymer compound is formed of a polymer compound having at least one skeleton represented by the following general formula (1), general formula (2A), general formula (2B) or general formula (2C):
Inventors:
Naomi Shinoda
Toru Gokawachi
Takuya Naito
Toru Gokawachi
Takuya Naito
Application Number:
JP2001295012A
Publication Date:
January 16, 2008
Filing Date:
September 26, 2001
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
C08F16/00; C08F24/00; C08F28/00; C08F32/00; C08F32/08; C08F34/02; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2001350265A |
Foreign References:
| WO2002036533A1 |
Attorney, Agent or Firm:
Takehiko Suzue
Sadao Muramatsu
Ryo Hashimoto
Satoshi Kono
Makoto Nakamura
Shoji Kawai
Sadao Muramatsu
Ryo Hashimoto
Satoshi Kono
Makoto Nakamura
Shoji Kawai