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Title:
高分子化合物、レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4133399
Kind Code:
B2
Abstract:
A polymer comprising recurring units of (1a) or (1b) wherein R1 is an acid labile group, adhesive group or fluoroalkyl, R2 is H, F, alkyl or fluoroalkyl, R3 and R4 each are a single bond, alkylene or fluoroalkylene, R5 is H or an acid labile group, "a" is 1 or 2, 0

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Inventors:
Yuji Harada
Jun Hatakeyama
Yoshio Kawai
Masako Sasako
Masataka Endo
Kishimura Shinji
Kazuhiko Maeda
Haruhiko Komoriya
Satoru Miyazawa
Application Number:
JP2003032675A
Publication Date:
August 13, 2008
Filing Date:
February 10, 2003
Export Citation:
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Assignee:
Shin-Etsu Chemical Co., Ltd.
Matsushita Electric Industrial Co., Ltd
Central Glass Co., Ltd.
International Classes:
C08F228/02; G03F7/004; C08F212/14; C08F220/12; C08F220/26; C08F232/08; C08G61/04; G03C5/00; G03F7/039; H01L21/027
Domestic Patent References:
JP2004002725A
JP2004244436A
JP2004109834A
JP2000231194A
JP2002327013A
JP2002322217A
JP2002293840A
JP2002169287A
JP2002333715A
JP2002341543A
JP2000327013A
JP2000322217A
JP2004067975A
Other References:
Journal of Photopolymer Science and Technology,2002年,Vol.15 No.4,643-54
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi



 
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