Title:
POLYMER FOR OPTICAL DISC SUBSTRATE AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JPH05222262
Kind Code:
A
Abstract:
PURPOSE:To obtain the subject polymer having excellent heat resistance, moldability, light transmittance and low water absorption properties, comprising a specific fluoromethacrylimide unit, a specific phenylmethacrylimide unit and a specific methacrylic acid, etc., in a specific ratio. CONSTITUTION:The objective polymer comprising (A) 10-80wt.% fluoromethacrylimide unit of formula I (R1 is fluorine-substituted phenyl or toluyl), (B) 0-50wt.% phenylmethacrylimide unit of formula II (n is 0-1) and (C) 90-20wt.% methacrylic acid of formula III (R2 is H, 1-20C aliphatic hydrocarbon or 1-20C fluorinated aliphatic hydrocarbon). The polymer is obtained by reacting a polymethacrylic acid anhydride with aniline or a fluorinated aniline at 150-250 deg.C and then esterifying the remaining acid group.
Inventors:
YAMAMOTO NAOKI
FUJIMOTO MASAHARU
NAGAMINE ATSUSHI
NAGAMORI KAORU
FUJIMOTO MASAHARU
NAGAMINE ATSUSHI
NAGAMORI KAORU
Application Number:
JP2809392A
Publication Date:
August 31, 1993
Filing Date:
February 14, 1992
Export Citation:
Assignee:
MITSUBISHI RAYON CO
International Classes:
C08L33/00; C08L33/02; C08L33/04; C08L33/12; C08L33/24; G11B7/24047; G11B7/2533; (IPC1-7): C08L33/00; C08L33/02; C08L33/12; G11B7/24