Title:
POLYMER FOR PRODUCTION OF CHEMICALLY AMPLIFIED RESIST AND RESIST COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP3120077
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To form a resist pattern excellent in adhesion to substrates, and dry etching resistance and excellent also in sensitivity and developability by adjusting the types of contents of functional-group-containing norbornene derivatives among the repeating units constituting the main chain.
SOLUTION: 100 pts.wt. at least one copolymer represented by the formula is mixed with 0.3-10 pts.wt. at least one acid generator and a suitable amount of a solvent to obtain a chemically modified resist composition. In the formula, X is formula II, formula III, or formula IV; R1 is acetyl, t-butyloxycarbonyl, cyclohexylcarbonyl, adamantanecarbonyl, bicyclo[2,2,1]heptanemethylcarbonyl, or the like; R2, R3, and R4 are each a 1-10C alkyl such as methyl, ethyl, t-butyl, i-propyl, bicyclo[2,2,1]heptanemethyl, or the like, or a cyclic/polycyclic alkyl; l+m+n+o=1; o is 0.4-0.6; and l, m, and n are each 0.5 or below.
Inventors:
Seo Dong-Chur
Paksung-i
Park Joo-hyun
Kim Sung-Ju
Paksung-i
Park Joo-hyun
Kim Sung-Ju
Application Number:
JP20242799A
Publication Date:
December 25, 2000
Filing Date:
July 16, 1999
Export Citation:
Assignee:
Corea Khunho Petrochemical Company Limited
International Classes:
C08F222/06; C08F232/08; C08G63/54; C08L35/02; G03F7/004; G03F7/039; (IPC1-7): C08F222/06; C08F232/08; C08G63/54; C08L35/02; G03F7/039
Domestic Patent References:
| JP10130340A | ||||
| JP10316720A |
Attorney, Agent or Firm:
Yoshihiro Kodama
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