Title:
POLYMER AND RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2012012593
Kind Code:
A
Abstract:
To provide a resin for a resist composition capable of producing a resist pattern excellent in the line edge roughness (LER).
The polymer contains a structural unit originated from a compound represented by formula (I), wherein R denotes a hydrogen atom, a methyl group or a trifluoromethyl group; Y1 and Y2 each independently denote a hydrogen atom or a 1-6C alkyl group; and X denotes a 1-12C perfluoroalkyl group.
Inventors:
TAKEMOTO KAZUKI
ANDO NOBUO
FUJITA SHINGO
ANDO NOBUO
FUJITA SHINGO
Application Number:
JP2011123162A
Publication Date:
January 19, 2012
Filing Date:
June 01, 2011
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08F20/28; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto
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