POLYMER SCALE DEPOSITION INHIBITOR, POLYMERIZER PROTECTED AGAINST POLYMER SCALE DEPOSITION, AND PRODUCTION OF POLYMER USING THE SAME

Title:

POLYMER SCALE DEPOSITION INHIBITOR, POLYMERIZER PROTECTED AGAINST POLYMER SCALE DEPOSITION, AND PRODUCTION OF POLYMER USING THE SAME

Document Type and Number:

Japanese Patent JPH05178910

Kind Code:

A

Abstract:

PURPOSE:To effectively prevent a polymerizer from suffering polymer scale deposition not only on a polymerizer's part which is in contact with the liquid phase but also on a polymericer's part around the interface between the gas and liquid phases, and to produce a polymer product which gives a molding having extremely diminished fish eyes, a high degree of whiteness, and improved initial colorability. CONSTITUTION:The title inhibitor, which is used in the polymerization of an ethylenic monomer, comprises a condensate obtained by adding an aromatic hydroxy compound to a reaction system where an aromatic amine is undergoing condensation. The polymerization for producing a polymer is conducted in a polymerizer having, on its inner wall, a coating film formed from this inhibitor.

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Inventors:

SHIMIZU TOSHIHIDE
WATANABE MIKIO

Application Number:

JP35942691A

Publication Date:

July 20, 1993

Filing Date:

December 27, 1991

Export Citation:

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Assignee:

SHINETSU CHEMICAL CO

International Classes:

C08F2/00; C09K3/00; (IPC1-7): C08F2/00; C09K3/00

Attorney, Agent or Firm:

Shuji Iwamiya

Previous Patent: JPS5178909

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