POLYMERIC COMPOUND, RESIST MATERIAL AND METHOD FOR FORMING PATTERN

Title:

POLYMERIC COMPOUND, RESIST MATERIAL AND METHOD FOR FORMING PATTERN

Document Type and Number:

Japanese Patent JP3944724

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To obtain a polymeric compound useful as a base polymer for a resist material suitable for a fine processing technology, especially a chemically amplifying resist material, a resist material, and to provide a method for forming a pattern.
SOLUTION: The polymeric compound contains a recurring unit expressed by formula (1) [wherein, R1 to R3 are each H, F, an alkyl or a fluorinated alkyl; R4 is a single bond, an alkylene or a fluorinated alkylene; R5 is a single bond, O, an alkylene or a fluorinated alkylene; R6 is methylene, O or S; R7 to R10 are each H, F, a fluorinated alkyl, R11OR12, R11COOR12 or OR12; R11 is a single bond, an alkylene or a fluorinated alkylene; R12 is H or an acid-labile group; and (a) is 0 or 1] and has 1,000-500,000 weight average molecular weight. The resist material is provided by having improved transparency, close adhesion and developing liquid permeability of the resist, at the same time capable of becoming a resist material having an excellent plasma etching resistance, easily forming patterns and suitable as the fine pattern-forming material for producing a super LSI (large scale integration).

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Inventors:

Yuji Harada
Jun Hatakeyama
Yoshio Kawai
Masako Sasako
Masataka Endo
Kishimura Shinji
Kazuhiko Maeda
Mitsutaka Otani
Haruhiko Komoriya

Application Number:

JP2002233045A

Publication Date:

July 18, 2007

Filing Date:

August 09, 2002

Export Citation:

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Assignee:

Shin-Etsu Chemical Co., Ltd.
Matsushita Electric Industrial Co., Ltd
Central Glass Co., Ltd.

International Classes:

C08F28/02; G03F7/039; C08F212/14; C08F220/22; C08F232/00; H01L21/027; (IPC1-7): C08F28/02; C08F212/14; C08F220/22; C08F232/00; G03F7/039; H01L21/027

Domestic Patent References:

JP2004062045A
JP2004062049A
JP2004002725A

Foreign References:

WO2003025675A1

Attorney, Agent or Firm:

Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi

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