Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
低い多分散性を有するポリマー状安定剤
Document Type and Number:
Japanese Patent JP4873782
Kind Code:
B2
Abstract:
The present invention relates to a polymerizable composition, comprising a) at least one compound of formula (I)wherein(Stab) is a light stabilizer radical selected from the group consisting of sterically hindered amines, hydroxyphenyl-s-triazines, hydroxyphenyl-benzotriazols and o-hydroxy-benzophenones; A is a spacer group or a direct bond; and(RG) is a group containing at least one ethylenically unsaturated functional group; and either b1) a compound of formula (II) whereinX represents a group having at least one carbon atom and is such that the free radical derived from X is capable of initiating polymerization andY represents a group being such that the free radical Y. derived from it forms a stable free radical; or b2) a stable free radical Y. and a free radical source from which a radical is formed capable of initiating polymerization, or b3) a compound of formula (III) and a catalytically effective amount of an oxidizable transition metal complex catalyst, whereinp represents a number greater than zero and defines the number of initiator fragments;q represents a number greater than zero;[In] represents a radically transferable atom or group capable of initiating polymerization and -[Hal] represents a leaving group; and optionally c) one or more ethylenically unsaturated monomers or oligomers different from those of formula (I). Further subjects of the invention are a polymerization process, the polymers, copolymers oligomers and cooligomers obtainable by this process and the use of the polymers, copolymers oligomers and cooligomers as heat or light stabilizers.

Inventors:
Steinmann, Alfred
Ross michael
Stauffer, Werner
Nesvadova, Peter
Murrebach, Andreas
Application Number:
JP2000591114A
Publication Date:
February 08, 2012
Filing Date:
December 14, 1999
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Ciba Holding Inc.
International Classes:
C07D209/44; C08F4/00; C08F20/34; C08F4/40; C08F12/14; C08F20/26; C08F246/00; C08K5/00; C08K5/07; C08K5/34; C08L101/00; C09K15/00; C09K15/08; C09K15/16; C09K15/18; C09K15/20; C09K15/30
Domestic Patent References:
JPS641712A1989-01-06
JPH04117410A1992-04-17
JPH08259545A1996-10-08
Attorney, Agent or Firm:
Calyx
Toshio Nakamura
Miyazaki Yoshio
Tsutomu Kato