Title:
イマージョンリソグラフィー用ポリマー及びこれを含むフォトレジスト組成物
Document Type and Number:
Japanese Patent JP4907977
Kind Code:
B2
Abstract:
A polymer for immersion lithography comprising a repeating unit represented by Formula 1 and a photoresist composition containing the same. A photoresist film formed by the photoresist composition of the invention is highly resistant to dissolution, a photoacid generator in an aqueous solution for immersion lithography, thereby preventing contamination of an exposure lens and deformation of the photoresist pattern by exposure.
Inventors:
Chung Zhao Chang
Choru Kei
Hayashi Masafumi
Sentence
Choru Kei
Hayashi Masafumi
Sentence
Application Number:
JP2005368436A
Publication Date:
April 04, 2012
Filing Date:
December 21, 2005
Export Citation:
Assignee:
HYNIX SEMICONDUCTOR INC.
International Classes:
C08F220/06; C08F32/08; C08F232/08; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2005055890A | ||||
| JP2001290276A | ||||
| JP2002251011A | ||||
| JP10221852A | ||||
| JP2004286845A |
Attorney, Agent or Firm:
Hiroshi Arafune
Yoshio Arafune
Yoshio Arafune