Title:
フォトレジスト組成物に好適なポリマー
Document Type and Number:
Japanese Patent JP2004529245
Kind Code:
A
Abstract:
The present invention relates to a novel polymer comprising at least one unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and at least one nonaromatic cyclic unit. The novel polymer is particularly useful when used in a photoresist composition sensitive in the deep ultraviolet region.
Inventors:
Dummel Ralph Earl
Sakamuri Rye
Sakamuri Rye
Application Number:
JP2002589530A
Publication Date:
September 24, 2004
Filing Date:
April 25, 2002
Export Citation:
Assignee:
Clariant International Limited
International Classes:
C08F220/42; C08F6/12; C08F222/32; C08F232/08; G03F7/038; G03F7/039; G03F7/004; (IPC1-7): C08F220/42; C08F6/12; C08F232/08
Attorney, Agent or Firm:
Mitsufumi Esaki
Tsuneo Mihara
Okumura Yoshimichi
Blacksmith
Tsuneo Mihara
Okumura Yoshimichi
Blacksmith