Title:
POLYOXYMETHYLENE RESIN COMPOSITION HAVING LOW GLOSS
Document Type and Number:
Japanese Patent JP3251318
Kind Code:
B2
Abstract:
PURPOSE: To obtain a polyoxymethylene resin composition excellent in low gloss property without impairing characteristic mechanical physical properties of a polyoxymethylene resin by adding a multiphase interpolymer having a specific composition to the polyoxymethylene resin.
CONSTITUTION: The objective polyoxymethylene resin composition having low gloss property is obtained by blending (A) 50-99wt.% resin consisting of a polyoxymethylene homopolymer, copolymer, branched polymer and block copolymer with (B) 1-50wt.% multiphase interpolymer having ≤1μm particle diameter and composed of preferably 60-99wt.% B1: a middle core phase consisting essentially of a copolymer of an ester (preferably ethylhexyl acrylate) of (meth)acrylic acid and 1-12C alkyl alcohol and a conjugated diene (preferably butadiene or isoprene) and preferably 1-40wt.% B2: an outer core phase consisting of a polymer of an ester (e.g. methyl methacrylate) of (meth)acrylic acid and a 1-4C alkyl alcohol.
Inventors:
Ryoichi Nakai
Kousuke Nagasaki
Kousuke Nagasaki
Application Number:
JP4121392A
Publication Date:
January 28, 2002
Filing Date:
February 27, 1992
Export Citation:
Assignee:
ASAHI KASEI KABUSHIKI KAISHA
International Classes:
C08L59/00; (IPC1-7): C08L59/00; C08L33:06
Domestic Patent References:
| JP3205442A | ||||
| JP314858A | ||||
| JP2251558A | ||||
| JP517514A |
Attorney, Agent or Firm:
Kazuo Watanabe
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