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Patent Searching and Data


Title:
POLYPROPYLENE-BASED FILM FOR RETORT
Document Type and Number:
Japanese Patent JP2003183418
Kind Code:
A
Abstract:

To provide a polypropylene-based film for a retort that has excellent heat stability, impact resistance and blocking resistance and has good sanitation for use as a retort packaging sealant, and to provide a retort laminated packaging bag having the film as an innermost layer.

The film comprises a propylene/ethylene block copolymer having a melting point of 150-168°C. The film has a three-dimensional surface roughness (center plane average roughness) (SRa1) of 0.08-0.50 μm and a surface roughness deformation rate represented by a formula (1) of -10-50%: surface roughness deformation rate = (SRa1-SRa2)/SRa1 (1), wherein SRa1: three-dimensional surface roughness of a film (center plane average surface roughness) and SRa2: three-dimensional surface roughness of a film subjected to pressure treatment (a load of 14.4 MPa was applied to a film surface under an atmosphere of 50°C for 30 minutes).


Inventors:
NISHI TADATSUGU
ODA NAONOBU
NAGANO HIROMU
YONEYAMA TADAO
Application Number:
JP2001387191A
Publication Date:
July 03, 2003
Filing Date:
December 20, 2001
Export Citation:
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Assignee:
TOYO BOSEKI
International Classes:
B65D81/34; B32B27/32; B65D81/24; C08J5/18; (IPC1-7): C08J5/18; B32B27/32; B65D81/24; B65D81/34
Attorney, Agent or Firm:
Osamu Mori (1 outside)