Title:
POLYSILICONE IMIDE AND PRODUCTION THEREOF
Document Type and Number:
Japanese Patent JPS6445432
Kind Code:
A
Abstract:
PURPOSE: To obtain the titled imide suitable as a film for flexible printed circuit board, by reacting bis(aminophenyl)tetraalkyldisiloxane with an aromatic tetracarboxylic acid dianhydride.
CONSTITUTION: (A) Bis(m-aminophenyl)1,1,3,3-tetraalkyldisiloxane is reacted with (B) an aromatic tetracarboxylic acid dianhydride to give (C) a polysilicone imide having a reaping unit shown by formula I [R1 is group shown by formula II or formula III [X is direct bond, -O-, -CO-, -S- or -SO2-; R2 is alkyl)]. A repeating unit shown by formula IV or formula V (X' is CO or SO2) is preferable as the repeating unit shown by the formula I.
Inventors:
KIMURA YOSHIHARU
Application Number:
JP20276487A
Publication Date:
February 17, 1989
Filing Date:
August 13, 1987
Export Citation:
Assignee:
TOA NENRYO KOGYO KK
International Classes:
C08G73/10; H05K1/03; (IPC1-7): C08G73/10; H05K1/03
Attorney, Agent or Firm:
Toshiaki Ikeura
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