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Title:
ポリシロキサン及びその製造方法
Document Type and Number:
Japanese Patent JP5448529
Kind Code:
B2
Abstract:

To provide a polysiloxane having a phosphorylcholine analog group, capable of suppressing pH restriction in use as a surface modifier, to provide a method of producing the polysiloxane, to provide a surface modifier containing the polysiloxane, and to provide a surface modification method using the surface modifier.

The polysiloxane has a constituent unit formed by binding a functional group represented by the general formula (wherein, R1, R2and R3independently represent a 1-6C alkyl group; and m represents an integer of 2-6), an ester or amide bond, a spacer, and a silicon atom sequentially.

COPYRIGHT: (C)2010,JPO&INPIT


Inventors:
Sumida
Kazufumi Miyazawa
Application Number:
JP2009087101A
Publication Date:
March 19, 2014
Filing Date:
March 31, 2009
Export Citation:
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Assignee:
Shiseido Co., Ltd.
International Classes:
A61K8/898; C08G77/395; A61L27/00; A61L31/00; A61L33/00; C09D183/08; C09K3/18
Domestic Patent References:
JP2004175830A
JP2006008987A
JP2003040942A
JP2006008661A
JP2007119643A
JP2007169163A
JP2006011380A
Attorney, Agent or Firm:
Tadahiko Ito