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Title:
多孔性高分子金属錯体、ガス吸着材、これを用いたガス分離装置およびガス貯蔵装置
Document Type and Number:
Japanese Patent JP6525686
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a porous polymer metal complex utilizable as a gas adsorbent capable of adsorbing oxygen and carbon monoxide selectively in a wide temperature region, and to provide a gas separation apparatus and a gas storage apparatus using the same.SOLUTION: A porous polymer metal complex has an aggregate structure expressed by [CuX](i). (In formula (i), X is a ligand of copper ion, and an isophthalic acid derivative having a functional group containing halogen other than fluorine on 5-position, and n shows an aggregation number of a metal complex comprising CuX, and n is not limited.)SELECTED DRAWING: Figure 4

Inventors:
Retail price Hiroshi
Shinji Tokumaru
Susumu Kitagawa
Ryotaro Matsuda
Application Number:
JP2015076280A
Publication Date:
June 05, 2019
Filing Date:
April 02, 2015
Export Citation:
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Assignee:
Nippon Steel Corporation
Kyoto University
International Classes:
C07C63/24; B01D53/02; B01J20/26; C07C65/21; F17C11/00
Domestic Patent References:
JP2014166969A
JP2000202283A
JP2011068631A
Foreign References:
WO2002068430A1
WO2014069574A1
Other References:
Ming-Ming Dong, Lu-Lu He, Ya-Juan Fan, Shuang-Quan Zang, Hong-Wei Hou, and Thomas C. W. Mak,Seven Copper Coordination Polymers Based on 5-Iodo-Isophthalic Acid: Halogen-Related Bonding and N-Donor Auxiliary Ligands Modulating Effect,Crystal Growth & Design,2013年,Vol. 13,pp.3353-3364
Jian-Hua Qin, jian-Ge Wang, Ke-Yan Zhao, and Yue Hu,Syntheses and Crystal Structures of Two New Complexes with 5-Bromoisophthalate and Bis(imidazole)Ligands,Synthesis and Reactivity in Inorganic, Metal-Organic, and Nano-Metal Chemistry,2011年,Vol. 41,pp.1358-1363
Prakash Kanoo, Ryotaro Matsuda, Hiroshi Sato, Liangchun Li, Hyung Joon Jeon, and Susumu Kitagawa,In Situ Generation of Functionality in a Reactive Haloalkane-Based Ligand for the Design of New Porous Coordination Polymers,Inorganic Chemistry,2013年,Vol. 52,pp.10735-10737
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Hiroshi Kamematsu
Fukuchi Ritsuo
Hashimura Kazumasa