PURPOSE: To make it possible to execute easily and correctly the positioning of a substrate to a mask by a method wherein a glaze layer is formed on the substrate made of ceramic and a layer, which is used as a positioning mark having a previously set form, is formed over the glaze layer.

CONSTITUTION: A glaze layer 19 consisting of glass or the like is formed on a substrate 17, which has a fine roughness and is made of ceramic, and a layer 21 which is used as a positioning mark 8 having a previously set form is formed over the smooth surface of this layer 19. Accordingly, light which is irradiated on the layer 21, which is used as the positioning mark, is sufficiently reflected and can be clearly observed. Thereby, the positioning of the substrate to a mask 15, which is used at the time of photoetching, can be executed easily and correctly.