POSITIVE PHOTORESIST COMPOSITION FOR MANUFACTURE OF SYSTEM LCD, METHOD FOR PREPARING THE POSITIVE PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Title:

POSITIVE PHOTORESIST COMPOSITION FOR MANUFACTURE OF SYSTEM LCD, METHOD FOR PREPARING THE POSITIVE PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2004361501

Kind Code:

A

Abstract:

To provide a positive photoresist composition having excellent storage stability suitable for the manufacture of a system LCD and to provide a method for preparing the positive photoresist composition and a method for forming a resist pattern.

The positive photoresist composition for the manufacture of an LCD having an integrated circuit and a liquid crystal display unit formed on one substrate is prepared by dissolving the following components in an organic solvent. The components are: (A) an alkali-soluble resin; (B) a naphthoquinone diazide esterified product containing an esterified product of a compound expressed by general formula (I) and a 1,2-naphthoquinone diazide sulfonyl compound; (C) a phenolic hydroxyl group-containing compound having ≤1,000 molecular weight; and (D) a reduction inhibitor.

Inventors:

DOI KOSUKE
NIIKURA SATOSHI
OUCHI YASUHIDE

Application Number:

JP2003156880A

Publication Date:

December 24, 2004

Filing Date:

June 02, 2003

Export Citation:

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Assignee:

TOKYO OHKA KOGYO CO LTD

International Classes:

G03F7/022; G02F1/13; G02F1/1343; G03F7/004; G03F7/039; G03F7/38; H01L21/027; (IPC1-7): G03F7/022; G02F1/13; G02F1/1343; G03F7/004; G03F7/38; H01L21/027

Attorney, Agent or Firm:

Sumio Tanai
Masatake Shiga
Masakazu Aoyama
Suzuki Mitsuyoshi
Noriko Yanai

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