ポジ型感光性組成物、パターン硬化膜およびその製造方法

Japanese Patent JP7257134

B2

To provide a positive photosensitive composition having high stability of line width and a wide process margin even when a time period from exposure to development is long.SOLUTION: The positive photosensitive composition comprises: a compound the an alkali solubility of which increases by an action of an acid as (A) component; a photoacid generator as (B) component; a basic compound having a morpholine ring as (C1) component; and at least one compound selected from a group consisting of a basic compound having an oxazoline ring and a compound having two or more piperidine rings in one molecule as (C2) component. The content of (C1) component with respect to 100 pts.wt of (B) component is 1 to 25 pts.wt., and the content of (C2) component with respect to 100 pts.wt. of (B) component is 1 to 25 pts.wt.SELECTED DRAWING: None

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Kohei Fujimoto
Arihiro Saito
Hiroshi Inari
Masahito Ide

JP2018226673A

April 13, 2023

December 03, 2018

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Kaneka Corporation

G03F7/004; G03F7/039; G03F7/20

JP2005306812A
JP2007154047A

Patent Attorney Corporation Haruka International Patent Office
Masato Shintaku
Yoshimoto power

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