Title:
POSITIVE PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD AND THIN FILM TRANSISTOR ARRAY SUBSTRATE
Document Type and Number:
Japanese Patent JP2008145715
Kind Code:
A
Abstract:
To provide a positive photosensitive composition suitable for use in the production of a liquid crystal display (LCD) for a big screen, a pattern forming method and a TFT array substrate.
The positive photosensitive composition has sensitivity at a wavelength of 365 nm or 405 nm and includes a slightly alkali-soluble resin, a photoacid generator and a nitrogen-containing basic compound. The pattern forming method includes a positive photosensitive layer forming step of forming a positive photosensitive layer on a surface of a substrate using the positive photosensitive composition. The TFT array substrate is formed by the pattern forming method.
Inventors:
TAKAYANAGI TAKASHI
KAWABE YASUMASA
KAWABE YASUMASA
Application Number:
JP2006332603A
Publication Date:
June 26, 2008
Filing Date:
December 08, 2006
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
G03F7/039; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Koichi Hirota
Yoshihiro Nagare
Naoko Matsuda
Yoshihiro Nagare
Naoko Matsuda