Title:
POSITIVE PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2003131383
Kind Code:
A
Abstract:
To provide a positive photosensitive composition excellent in resolving power and having small density dependence.
The positive photosensitive composition comprises (A) a compound which generates ≥2C fluorine-substituted sulfonic acid upon irradiation with an active ray or radiation and (B) a resin which has repeating units containing a specified group of formula (1) and is decomposed by the action of an acid to increase solubility in an alkali developing solution. In the formula (1), Z0 is a group of formula (2) or (3).
Inventors:
KODAMA KUNIHIKO
Application Number:
JP2001330625A
Publication Date:
May 09, 2003
Filing Date:
October 29, 2001
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/039; C07C381/12; C08F20/28; C08F32/04; H01L21/027; (IPC1-7): G03F7/039; C08F20/28; C08F32/04; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri (4 outside)