To provide a positive photosensitive composition excellent in line edge roughness to solve a technical problem to enhance the performance of microphotofabrication using far-ultraviolet rays especially ArF eximer laser beam.

The positive photosensitive composition comprises (A1) an ionic compound which generates an aromatic sulfonic acid substituted by at least one fluorine atom and/or a group having at least one fluorine atom upon irradiation with an actinic ray or a radiation, (A2) a nonionic compound which generates an acid upon irradiation with an actinic ray or a radiation and (B) a resin which has an alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution.