ポジ型感放射線性組成物、層間絶縁膜及びその形成方法

Japanese Patent JP5413124

B2

To provide a polysiloxane-based positive radiation-sensitive composition which enables to form an interlayer insulating film having a sufficiently high surface hardness and is excellent in melt flow resistance in a heating step after development.

The positive radiation-sensitive composition contains [A] a siloxane polymer, [B] a (meth)acryloyl group-containing polymer, and [C] a quinonediazide compound, wherein the siloxane polymer [A] may be a hydrolytic condensation product of a hydrolyzable silane compound. The positive radiation-sensitive composition may further contain [D] a thermosensitive acid generator or a thermosensitive base generator.

COPYRIGHT: (C)2011,JPO&INPIT

WO/2010/087238	RESIN COMPOSITION AND DISPLAY DEVICE FORMED USING SAME
JP3125894	INDUSTRIAL APPLICABILITY [Title of Invention] Positive Photoresist Composition
JP6826193	A photosensitive resin composition, a cured film formed from the photosensitive resin composition, and an electronic device having the cured film.

Daigo Ichinohe
Hanamura Masaaki

JP2009243823A

February 12, 2014

October 22, 2009

Click for automatic bibliography generation  

JSR CORPORATION

G03F7/023; C08F299/00; G02F1/1333; G03F7/004; G03F7/075; H01L21/027

JP2004264870A
JP2009093171A
JP2009169343A
JP2004149699A
JP2009145693A
JP2008256974A
JP2009192851A

Hajime Amano
Fujimoto Katsune
Yoshinori Ikeda
Satoru Miyazaki
Hiroshi Ogawa
Fujii Kosuke
Sanae Kato

Previous Patent: JPS5413123

Next Patent: REFUSE COLLECTING VEHICLE