Title:
POSITIVE RADIATION SENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2003322972
Kind Code:
A
Abstract:
To provide a positive radiation sensitive composition showing sufficient transmission property when a light source of 157 nm wavelength is used, having wide latitude for defocusing, and suppressing development defects.
The positive radiation sensitive composition contains (A1) an ionic compound which generates an acid by irradiation of active rays or radiation, (A2) a nonionic compound which generates an acid by irradiation with active rays or radiation, (B) a resin having a specified repeating unit, the solubility of which to an alkali developer liquid increases by the effect of the acid, and (C) a solvent.
Inventors:
KANNA SHINICHI
MIZUTANI KAZUYOSHI
SASAKI TOMOYA
MIZUTANI KAZUYOSHI
SASAKI TOMOYA
Application Number:
JP2002130718A
Publication Date:
November 14, 2003
Filing Date:
May 02, 2002
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/039; C08F10/00; C08F12/22; C08F20/22; C08F20/26; C08F32/00; G03F7/004; H01L21/027; (IPC1-7): G03F7/039; C08F10/00; C08F12/22; C08F20/22; C08F20/26; C08F32/00; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri (4 outside)