Title:
POSITIVE RESIST COMPOSITION AND ITS MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2004294688
Kind Code:
A
Abstract:
To provide a positive resist composition excellent in dependence on the concentration of a developing solution and durability against side lobe light (side robe margin).
The chemical amplifying resist composition contains: (A-1) a resin having a fluorine atom in the main chain of the polymer skeleton; (A-2) a resin containing a repeating unit having a specified structure having a fluorine atom in the side chain of the polymer skeleton; and (B) a compound which generates an acid by irradiation of active rays or radiation.
Inventors:
KANNA SHINICHI
MIZUTANI KAZUYOSHI
SASAKI TOMOYA
MIZUTANI KAZUYOSHI
SASAKI TOMOYA
Application Number:
JP2003085830A
Publication Date:
October 21, 2004
Filing Date:
March 26, 2003
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/039; C08F32/00; H01L21/027; (IPC1-7): G03F7/039; C08F32/00; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Yuriko Hamada
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Yuriko Hamada