To provide a positive resist composition capable of forming a resist pattern of a good shape with reduced LWR by superior sensitivity, a high molecular compound that can be used as a base material of the positive resist composition, a compound that can be used for synthesizing a structural unit of the high molecular compound, and a resist pattern forming method.
The positive resist composition contains a base material component (A) of which solubility to alkali developing solution increases by the action of acid, and an acid generator component (B) that generates acid by exposure. The base material component (A) contains a high molecular compound (A1) having a structural unit (a0) including an acid dissociable dissolution inhibiting group, and the acid dissociable dissolution inhibiting group in the structural unit (a0) includes a group expressed by a formula (a0-0-1). In the formula (a0-0-1), R
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Yoshiyuki Utsumi
Hideo Haneda
Atsushi Iwashita
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