POSITIVE RESIST COMPOSITION - FUJI PHOTO FILM CO LTD

Title:

POSITIVE RESIST COMPOSITION

Document Type and Number:

Japanese Patent JP2004101934

Kind Code:

A

Abstract:

To provide a positive resist composition which is suitably used for use of an exposure light source of ≤160 nm, specially, F2 excimer laser light (157 nm) and shows sufficient transparency in use of the light source of 157 nm and has high sensitivity, a high contrast, and superior coating property.

This positive resist composition contains a resin, having at least one repetitive unit which has an acid decomposition group or an alkali-soluble group and has at least one fluorine atom, at a side chain.

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Inventors:

SASAKI TOMOYA
MIZUTANI KAZUYOSHI
KANNA SHINICHI

Application Number:

JP2002264489A

Publication Date:

April 02, 2004

Filing Date:

September 10, 2002

Export Citation:

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Assignee:

FUJI PHOTO FILM CO LTD

International Classes:

G03F7/039; C08F12/04; C08F20/10; C08F32/00; H01L21/027; (IPC1-7): G03F7/039; C08F12/04; C08F20/10; C08F32/00; H01L21/027

Attorney, Agent or Firm:

Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Yuriko Kuriu

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