Title:
POSITIVE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2005043723
Kind Code:
A
Abstract:
To provide a positive resist composition which is little in development defect.
The positive resist composition is characterised in that it contains (A) a fluorine-containing resin having a structure in which fluorine has been substituted on a backbone and/or on a side chain of a polymer skeleton and having a group which is decomposed by the action of an acid to increase solubility in an alkali developing solution, (B) a compound which generates an acid upon irradiation with an actinic ray, and (C) a nitrogen-containing compound containing at least one fluorine atom.
Inventors:
FUJIMORI TORU
Application Number:
JP2003278546A
Publication Date:
February 17, 2005
Filing Date:
July 23, 2003
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/039; C08F214/26; C08F232/04; G03F7/004; H01L21/027; (IPC1-7): G03F7/039; C08F214/26; C08F232/04; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Yuriko Hamada
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Yuriko Hamada
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