Title:
ポジ型レジスト組成物
Document Type and Number:
Japanese Patent JP4007570
Kind Code:
B2
Abstract:
A positive-working electron beam or X-ray resist composition comprising:(a) a compound capable of generating an acid by irradiation of an electron beam or X-ray;(b) a resin containing a group which is decomposable by action of an acid to increase solubility in an alkali developing solution or (e) a resin insoluble in water and soluble in the alkali developing solution; and(c) a fluorine and/or silicon surfactant,the compound capable of generating an acid by irradiation of an electron beam or X-ray being a compound which generates benzenesulfonic acid, naphthalenesulfonic acid or anthracenesulfonic acid which is substituted by at least one fluorine atom and/or at least one group containing a fluorine atom.
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Inventors:
Kunihiko Kodama
Toshiaki Aoi
Kazuya Uenishi
Toshiaki Aoi
Kazuya Uenishi
Application Number:
JP27533499A
Publication Date:
November 14, 2007
Filing Date:
September 28, 1999
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
C08F12/22; G03F7/039; G03F7/004; H01L21/027
Domestic Patent References:
| JP9068803A | ||||
| JP8254820A | ||||
| JP10221854A | ||||
| JP9054437A | ||||
| JP10260533A | ||||
| JP9258435A | ||||
| JP10186662A | ||||
| JP10123703A | ||||
| JP10274845A | ||||
| JP10133378A | ||||
| JP10097075A | ||||
| JP7257018A | ||||
| JP8062847A |
Foreign References:
| WO1997027515A1 |
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Kiyozumi Yazawa
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Kiyozumi Yazawa