POSITIVE RESIST MATERIAL AND PATTERNING METHOD

Title:

POSITIVE RESIST MATERIAL AND PATTERNING METHOD

Document Type and Number:

Japanese Patent JP2022183029

Kind Code:

A

Abstract:

To provide a positive resist material that has sensitivity and resolution surpassing those of the conventional positive resist material, is small in edge roughness and dimensional variation, and has a good pattern profile after exposure, and a patterning method.SOLUTION: A positive resist material contains a base polymer containing a repeat unit having a hydrogen atom of a carboxy group substituted with a nitrobenzene ring-containing tertiary hydrocarbyl group.SELECTED DRAWING: None

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Inventors:

HATAKEYAMA JUN
FUKUSHIMA MASAHIRO

Application Number:

JP2022077365A

Publication Date:

December 08, 2022

Filing Date:

May 10, 2022

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Assignee:

SHINETSU CHEMICAL CO

International Classes:

G03F7/039; C07D307/93; C07D333/76; C08F212/08; C08F220/10; G03F7/004

Attorney, Agent or Firm:

Patent Attorney Corporation Eimei International Patent Office

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