POSITIVE TYPE CHEMICAL AMPLIFICATION TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR PRODUCING RESIST IMAGE

Japanese Patent JP2001330960

A

To provide a positive type chemical amplification type photosensitive resin composition having high sensitivity, high resolution and a good pattern shape, and a method for producing a resist image by which a resist pattern having good resolution and a good pattern shape can be obtained.

In the positive type chemical amplification type photosensitive resin composition containing (a) a resin soluble in an aqueous alkali solution, (b) a compound which generates an acid when irradiated with active actinic radiation and (c) a compound having an acid decomposable group which ensures increased solubility in the aqueous alkali solution by an acid catalyzed reaction in its molecule, the compound (c) has 6-20 benzene rings. In the method for producing a resist image, a coating film of the composition is irradiated with active actinic radiation and developed.

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KATO KOJI
KASUYA KEI
HASHIMOTO MASAHIRO
ARAI TADASHI

JP2000152584A

November 30, 2001

May 24, 2000

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HITACHI CHEMICAL CO LTD

G03F7/039; C08K5/42; C08L61/08; C08L101/14; G03F7/004; H01L21/027; (IPC1-7): G03F7/039; C08K5/42; C08L61/08; C08L101/14; G03F7/004; H01L21/027

Hotaka Tetsuo

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